New BEAMER Version 4.3.0
What's new:
- Multipass exposure support
- "Undersize / Overdose" contrast enhancement
- New Region Extract options
- Advanced view of overlay / overlap
Read More>>
|
You are kindly invited to meet GenISys at our booth at the Photomask Japan 2012 - held from April 17-19th, 2012 in Yokohama. (http://www.photomask-japan.org/)
|
|
You are kindly invited to participate in our next BEAMeeting in Leeds, UK:
Date: May 9th, 2012 - from 10:00am till 5:00pm.
Location: University of Leeds, Electrical Engineering Building, Room 3.52 - 3rd Floor, Leeds, UK.
For more information and registration please e-mail:
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
|
|
Meet us at the EIPBN 2012 Conference at our booth! You are also kindly invited to participate in our BEAMeeting on the 29th of May 2012.
Location: Hotel Hilton Waikola, Hawaii - Room King 1 at 10:00am till 3:00 pm.
For more information and registration please e-mail:
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
|
|
|
NEW Layout LAB Version 3 & LAB Pro Version 1
Layout LAB V3: 3D Proximity Lithography Simulation
The new version of Layout LAB, the 3D simulation software for optical lithography using mask aligneror other proximity exposure tools offers:
- More accurate modeling
- More flexible evaluation
|
|
PRESS RELEASE
SUSS Microtec and GenISys Announce Cooperation on Mask Aligner Lithography Simulation Software
|
|
 Garching, GERMANY, February 21, 2012 - SUSS MicroTec a leading supplier of equipment and process solutions for the semiconductor industry and related markets and GenISys GmbH, provider of high-performance software solutions for nano scale fabrication, today announced a cooperation agreement to combine the SUSS MicroTec mask aligner tools with the GenISys simulation software Layout LAB.
Read More>>
|
|
|
|
|
