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Press Releases

Feb 09 2015 - KBTEM-OMO JSC and GenISys Announce Cooperation

Minsk, Belarus, February 06, 2015 -  KBTEM-OMO JSC, Republic of Belarus, a leading tool supplier and process solution provider of production line instrumentation for mask fabrication, inspection and repair as well as photolithography tools and GenISys GmbH, a provider of high performance software solution for lithography, announced a cooperation agreement to combine the KBTEM-OMO JSC equipment with advanced data-preparation, simulation and process correction software packages of BEAMER and LAB. Within the scope of the agreement, GenISys GmbH extends the BEAMERTM software package to import and export data formats of laser scan and microphotosetting pattern generators as well as inspection tools…
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Oct 21 2014 - Heidelberg Instruments and GenISys Announce Cooperation on Maskless Laser Lithography

 Heidelberg, GERMANY, October 21, 2014 – Heidelberg Instruments, a leading supplier of equipment and process solutions for laser lithography related markets and GenISys GmbH, a provider of high-performance software solutions for nanoscale fabrication, today announced a cooperation agreement to combine the Heidelberg Instruments laser lithography tools with the GenISys data-preparation, simulation and process correction software packages of BEAMERTM and LABTM. Within the cooperation GenISys BEAMERTM has been adapted to support Heidelberg Instruments laser exposure systems with advanced layout data preparation. The 3D simulation software LABTM has been extended to model the exposure of HIMT laser…
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Sep 12 2013 - Publication: 3D TOPOGRAPHY MASK ALIGNER LITHOGRAPHY SIMULATION" - IN SUSS REPORT 2013/01

3D TOPOGRAPHY MASK ALIGNER LITHOGRAPHY SIMULATON, Authors: Ulrich Hofmann and Nezih Ünal from GenISys GmbH, Ralph Zoberbier from SUSS MicroTec Lithography GmbH, Ton Nellisen from Philips Research, Eindhoven, Netherlands has been published on page 20 thru 23 of the SUSS Report 2013/01.     click the download button to see/download the Article        
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Feb 21 2012 - SUSS MicroTec and GenISys Announce Cooperation on Mask Aligner Lithography Simulation Software

Garching, GERMANY, February 21, 2012 – SUSS MicroTec a leading supplier of equipment and process solutions for the semiconductor industry and related markets and GenISys GmbH, provider of high-performance software solutions for nano scale fabrication, today announced a cooperation agreement to combine the SUSS MicroTec mask aligner tools with the GenISys simulation softwareLayout LABWithin the cooperation GenISys Layout LAB has been enhanced to accurately model all available SUSS MicroTec mask aligner exposure optics. Both parties join forces to market the SUSS MicroTec mask aligner technology with the GenISys lithography simulation software Layout LAB. The combination of lithography equipment…
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Jan 21 2010 - GenISys to Enhance Layout BEAMER and Layout LAB By Integrating Juspertor’s LayoutEditor.

MUNICH, Germany – Jan. 21, 2010 – GenISys GmbH, provider of high-performance software solutions for nanoscale fabrication, today announced an agreement with Juspertor UG (haftungsbeschränkt) that will significantly enhance its existing Layout BEAMER™ and Layout LAB™ products. GenISys and Juspertor have agreed to integrate Juspertor's LayoutEditor into the GenISys tool suite. LayoutEditor is a versatile and sophisticated editor, with a broad application range. This integration enables a complete design-to-fabrication flow within one software platform. Leading fabrication centers worldwide – already using the GenISys tools for data preparation, correction and simulation – will now be able to create…
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Sep 14 2009 - GenISys GmbH joins the eBeam Initiative roster to accelerate the adoption of design for e-beam technology

Munich, Germany - September 14,  2009 - GenISys GmbH joins the eBeam Initiative roster to accelerate the adoption of design for e-beam technology The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that GenISys GmbH, a provider of e-beam software solutions, has joined its membership base.  The Initiative provides a platform for GenISys to expand its collaboration and education efforts, while contributing to the Initiative’s goal of increasing industry investment in the adoption of DFEB solutions. GenISys’ Layout BEAMER serves as a comprehensive data-preparation library that integrates…
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Mar 07 2008 - GenISys Supplies Layout BEAMER E-Beam Lithography Software to Caltech and Two U.S. National Laboratories

Los Gatos, CA – March 7, 2008 – GenISys GmbH, a provider of e-beam direct write software solutions, today announced that three more U.S. research institutions have adopted its advanced e-beam lithography software. These world-class R&D centers’ purchase decisions help to secure GenISys’ leading market position and to establish a new standard in this emerging technology area. Oak Ridge National Laboratory and Argonne National Laboratory – both part of the U.S. Department of Energy’s work in the area of nanoscale materials science – have implemented GenISys’ Layout BEAMER software for their advanced data preparation needs. Also choosing Layout BEAMER is the California Institute of Technology,…
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Dec 12 2007 - GENISYS BUILDS "POWER TEAM" IN ADVANCED PROCESS MODELING & CORRECTION FOR E-BEAM & MASK ALIGNER LITHO

MUNICH, Germany - December 12, 2007 - GenISys Signs Research & Licensing Agreement with Fraunhofer IISB, Adds PEC Expert Nikola Belic to Development Team  Positioning itself for future growth and market leadership, GenISys GmbH, a provider of software for optimization of microstructure fabrication processes, today announced it has signed an agreement with the Fraunhofer Institute of Integrated Systems and Device Technology (IISB) for the development and licensing of advanced 3-D resist modeling techniques for e-beam and proximity lithography. GenISys further announced that Nikola Belic, a leading pioneer in proximity effect correction (PEC) technology and developer of the widely used Proxecco…
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Jun 04 2007 - GENISYS FORMS DEVELOPMENT PARTNERSHIP WITH JEOL AND CORNELL UNIVERSITY

MUNICH, Germany – June 4, 2007. Trilateral Technology Collaboration Focuses on New, Integrated Advanced Direct Write e-Beam Nano-EPC Solutions GenISys GmbH, a provider of software for optimization of microstructure fabrication processes focusing on e-beam direct write, today announced it has formed a technology development partnership with JEOL, Ltd., and Cornell University’s Nanoscale Science and Technology Facility. Together, the three organizations are collaborating to develop advanced solutions for direct write e-beam data preparation and electron process correction (nano-EPC) technologies for nanometer-range structures. In this partnership, each organization is leveraging its unique…
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Apr 17 2007 - GENISYS EXPANDS GLOBAL REACH WITH NEW TOKYO OFFICE SERVING JAPAN AND ASIA-PACIFIC MARKETS

MUNICH, Germany – April 17, 2007 – GenISys GmbH, a provider of software for optimization of microstructure fabrication processes, today announced the opening of its new Tokyo office. With this expanded presence in Asia, GenISys will be better able to meet the growing global demand for efficient, high-performance data preparation and proximity effect correction (PEC) for e-Beam direct-write (EBDW) and mask aligner (proximity printing) lithography simulation. The new office will also allow GenISys to provide localized, direct sales and support to its growing Japanese customer base. In addition, GenISys named software industry veteran John Sachen Director of Asia- Pacific Operations. As head of…
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