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Events

Feb 02 2017 - SPIE Advanced Lithography Conference 2017 at San Jose - Simulation Workshop & BEAMeeting on Thursday, 2nd of March

You are very welcome to visit our booth #344 at the SPIE Advanced Lithography Conference in San Jos CA from Feb 27 until Mar 2, 2017. The GenISys Simulation Workshop & BEAMeeting will be held on March 2nd from 9:00 am to 5:00 pm.  For complete details please push button below  
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Feb 01 2017 - BEAMeeting at IMS Stuttgart in Germany on March 27-28, 2017

The next BEAMeeting in Europe will be held at IMS Chips in Stuttagrt Germany on March 27 and March 28, 2017. We will start with an interactive training with Daniel Ritter focused on new features of BEAMER. The technical workshop will start at noon with presentation and discussion on interesting application and technologies from BEAMER user and from GenISys. We will have a joint dinner in the evening and will continue with the workshop next day until noon. In the afternoon we have the possibility for equipment specific discussin in groups.  For complete details please push button below  
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Oct 06 2016 - China Lithography Conference - Chongqing / China - BEAMeeting

We are kindly inviting you to participate in BEAMeeting on Wednesday, October 26th at the China Lithography Conference 2016 in Chongqing. The meeting is a technical exchange platform for the direct write community with focus on e-beam and laser lithography along with data preparation, PEC, process correction, and simulation. We encourage attendees to directly participate through user presentations, discussions on applications, specific issue solutions, and feature needs or requirements. We will present and openly discuss new highlights relating to BEAMER, LAB and TRACER (Monte Carlo Simulation). The BEAMeeting is free of charge. Further information regarding venue etc. will be mailed when available.…
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Newsletter

Dec 28 2016 - NEWSLETTER Q3 2016

Our Newsletter Q3/2016 can be downloaded by pushing the button below  
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Aug 03 2016 - NEWSLETTER Q2 2016

Our Newsletter Q2/2016 can be downloaded by pushing the button below  
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Mar 02 2016 - NEWSLETTER Q1 2016

Our Newsletter Q1/2016 can be downloaded by pushing the button below  
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Press Releases

Feb 09 2015 - KBTEM-OMO JSC and GenISys Announce Cooperation

Minsk, Belarus, February 06, 2015 -  KBTEM-OMO JSC, Republic of Belarus, a leading tool supplier and process solution provider of production line instrumentation for mask fabrication, inspection and repair as well as photolithography tools and GenISys GmbH, a provider of high performance software solution for lithography, announced a cooperation agreement to combine the KBTEM-OMO JSC equipment with advanced data-preparation, simulation and process correction software packages of BEAMER and LAB. Within the scope of the agreement, GenISys GmbH extends the BEAMERTM software package to import and export data formats of laser scan and microphotosetting pattern generators as well as inspection tools…
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Oct 21 2014 - Heidelberg Instruments and GenISys Announce Cooperation on Maskless Laser Lithography

 Heidelberg, GERMANY, October 21, 2014 – Heidelberg Instruments, a leading supplier of equipment and process solutions for laser lithography related markets and GenISys GmbH, a provider of high-performance software solutions for nanoscale fabrication, today announced a cooperation agreement to combine the Heidelberg Instruments laser lithography tools with the GenISys data-preparation, simulation and process correction software packages of BEAMERTM and LABTM. Within the cooperation GenISys BEAMERTM has been adapted to support Heidelberg Instruments laser exposure systems with advanced layout data preparation. The 3D simulation software LABTM has been extended to model the exposure of HIMT laser…
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Sep 12 2013 - Publication: 3D TOPOGRAPHY MASK ALIGNER LITHOGRAPHY SIMULATION" - IN SUSS REPORT 2013/01

3D TOPOGRAPHY MASK ALIGNER LITHOGRAPHY SIMULATON, Authors: Ulrich Hofmann and Nezih Ünal from GenISys GmbH, Ralph Zoberbier from SUSS MicroTec Lithography GmbH, Ton Nellisen from Philips Research, Eindhoven, Netherlands has been published on page 20 thru 23 of the SUSS Report 2013/01.     click the download button to see/download the Article        
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