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Events

Oct 06 2016 - China Lithography Conference - Chongqing / China - BEAMeeting

We are kindly inviting you to participate in BEAMeeting on Wednesday, October 26th at the China Lithography Conference 2016 in Chongqing. The meeting is a technical exchange platform for the direct write community with focus on e-beam and laser lithography along with data preparation, PEC, process correction, and simulation. We encourage attendees to directly participate through user presentations, discussions on applications, specific issue solutions, and feature needs or requirements. We will present and openly discuss new highlights relating to BEAMER, LAB and TRACER (Monte Carlo Simulation). The BEAMeeting is free of charge. Further information regarding venue etc. will be mailed when available.…
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Oct 05 2016 - MNC 2016 - Kyoto - Japan - BEAMeeting

Our traditional BEAMeeting during the MNC 2016 is planned for Tuesday, 8th of November, 2016 from 09:30 till 13:00 !    BEAMeetings are a technical exchange platform for the e-beam community focused on e-beam lithography, data-preparation, PEC, process correction,  e-beam and Monte Carlo simulation.  As always we like to setup the agenda with your input!  We encourage user presentations, and welcome any discussions on applications, specific issue solutions, and feature needs or requirements. The final agenda for the meetings are based on all inputs from the e-beam community  You are also invited to visit us at our booth during the technical exhibition.    For complete details please push…
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Jul 27 2016 - MNE2016 - Vienna / Austria - BEAMeeting

Our traditional BEAMeeting during the MNE2016 is planned for Monday, 19st of September, 2016 from 09:00 till 13:00 !    BEAMeetings are a technical exchange platform for the e-beam community focused on e-beam lithography, data-preparation, PEC, process correction,  e-beam and Monte Carlo simulation.  As always we like to setup the agenda with your input!  We encourage user presentations, and welcome any discussions on applications, specific issue solutions, and feature needs or requirements. The final agenda for the meetings are based on all inputs from the e-beam community  You are also invited to visit us at our booth No. 27 during the exhibition.    For complete details please push button…
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Newsletter

Aug 03 2016 - NEWSLETTER Q2 2016

Our Newsletter Q2/2016 can be downloaded by pushing the button below  
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Mar 02 2016 - NEWSLETTER Q1 2016

Our Newsletter Q1/2016 can be downloaded by pushing the button below  
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Oct 08 2015 - NEWSLETTER Q3_2015

Featured in this issue: At the MNE in The Hague we celebrated together with users and partners “10 years of GenISys”.
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Press Releases

Feb 09 2015 - KBTEM-OMO JSC and GenISys Announce Cooperation

Minsk, Belarus, February 06, 2015 -  KBTEM-OMO JSC, Republic of Belarus, a leading tool supplier and process solution provider of production line instrumentation for mask fabrication, inspection and repair as well as photolithography tools and GenISys GmbH, a provider of high performance software solution for lithography, announced a cooperation agreement to combine the KBTEM-OMO JSC equipment with advanced data-preparation, simulation and process correction software packages of BEAMER and LAB. Within the scope of the agreement, GenISys GmbH extends the BEAMERTM software package to import and export data formats of laser scan and microphotosetting pattern generators as well as inspection tools…
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Oct 21 2014 - Heidelberg Instruments and GenISys Announce Cooperation on Maskless Laser Lithography

 Heidelberg, GERMANY, October 21, 2014 – Heidelberg Instruments, a leading supplier of equipment and process solutions for laser lithography related markets and GenISys GmbH, a provider of high-performance software solutions for nanoscale fabrication, today announced a cooperation agreement to combine the Heidelberg Instruments laser lithography tools with the GenISys data-preparation, simulation and process correction software packages of BEAMERTM and LABTM. Within the cooperation GenISys BEAMERTM has been adapted to support Heidelberg Instruments laser exposure systems with advanced layout data preparation. The 3D simulation software LABTM has been extended to model the exposure of HIMT laser…
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Sep 12 2013 - Publication: 3D TOPOGRAPHY MASK ALIGNER LITHOGRAPHY SIMULATION" - IN SUSS REPORT 2013/01

3D TOPOGRAPHY MASK ALIGNER LITHOGRAPHY SIMULATON, Authors: Ulrich Hofmann and Nezih Ünal from GenISys GmbH, Ralph Zoberbier from SUSS MicroTec Lithography GmbH, Ton Nellisen from Philips Research, Eindhoven, Netherlands has been published on page 20 thru 23 of the SUSS Report 2013/01.     click the download button to see/download the Article        
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